Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands was written by Han, Jeong Hwan;Jung, Eun Ae;Kim, Hyo Yeon;Kim, Da Hye;Park, Bo Keun;Park, Jin-Seong;Son, Seung Uk;Chung, Taek-Mo. And the article was included in Applied Surface Science in 2016.Recommanded Product: 14123-48-9 This article mentions the following:
In2O3 thin films were grown from a liquid homoleptic In-based complex, tris(1-dimethylamino-2-methyl-2-propoxy)indium [In(dmamp)3], and O3 by at. layer deposition (ALD) at growth temperatures of 150-200 °C. In(dmamp)3 exhibited single-step evaporation with negligible residue and excellent thermal stability between 30 and 250 °C. The self-limiting surface reaction of In2O3 during ALD was demonstrated by varying the In(dmamp)3 and O3 pulse lengths, with a growth rate of 0.027 nm/cycle achieved at 200 °C. The In2O3 films grown at temperatures over 175 °C exhibited negligible concentrations of impurities, whereas that grown below 175 °C had concentrations of residual C of 6-8 at.%. Glancing angle X-ray diffraction revealed that the In2O3 films were polycrystalline in nature when the deposition temperature was greater than 200 °C. The In2O3 films grown at 150-200 °C exhibited carrier concentrations of 1.5 × 1018-6.6 × 1019 cm-3, resistivities of 15.1-2 × 10-3 Ω cm, and Hall mobilities of 0.8-42 cm2/(V s). In the experiment, the researchers used many compounds, for example, 1-(Dimethylamino)-2-methylpropan-2-ol (cas: 14123-48-9Recommanded Product: 14123-48-9).
1-(Dimethylamino)-2-methylpropan-2-ol (cas: 14123-48-9) belongs to alcohols. Alkyl halides are often synthesized from alcohols, in effect substituting a halogen atom for the hydroxyl group. Grignard and organolithium reagents are powerful tools for organic synthesis, and the most common products of their reactions are alcohols.Recommanded Product: 14123-48-9
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